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BOOK SUMMARY :

Pvd for microelectronics sputter deposition applied to semiconductor manufacturing thin films012533026x pvd for microelectronics sputter deposition applied to semiconductor manufacturing thin films by ronald a powell stephen rossnagelpvd for microelectronics sputter deposition applied to semiconductor manufacturing thin films 26 by ronald a powell 13138 publisher academic press 1st edition november 15 1998 436 pagespowell a rossnagel sm 1999 pvd for microelectronics sputter deposition applied to semiconductor manufacturing thin films vol 26 academic new york google scholar ramadas sk chua sj 2010 nanoparticulate encapsulation barrier stack us patent application 12513569 us 20100089636 a1deposition of thin films by the main physical deposition methods of vacuum evaporation molecular beam epitaxy and sputtering are described in some detail as are those by the chemical deposition methods of electrodeposition chemical vapour deposition and the langmuirblodgett technique

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